JPS565574B2 - - Google Patents
Info
- Publication number
- JPS565574B2 JPS565574B2 JP4972073A JP4972073A JPS565574B2 JP S565574 B2 JPS565574 B2 JP S565574B2 JP 4972073 A JP4972073 A JP 4972073A JP 4972073 A JP4972073 A JP 4972073A JP S565574 B2 JPS565574 B2 JP S565574B2
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Landscapes
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Investigating Or Analyzing Non-Biological Materials By The Use Of Chemical Means (AREA)
- Physical Or Chemical Processes And Apparatus (AREA)
- Manufacturing Of Printed Circuit Boards (AREA)
- Drying Of Semiconductors (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP4972073A JPS565574B2 (en]) | 1973-05-07 | 1973-05-07 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP4972073A JPS565574B2 (en]) | 1973-05-07 | 1973-05-07 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS501667A JPS501667A (en]) | 1975-01-09 |
| JPS565574B2 true JPS565574B2 (en]) | 1981-02-05 |
Family
ID=12839013
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP4972073A Expired JPS565574B2 (en]) | 1973-05-07 | 1973-05-07 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS565574B2 (en]) |
Families Citing this family (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS51119478A (en) * | 1975-04-10 | 1976-10-20 | Nakamuratome Seimitsu Kogyo Kk | Flow adjusting method for flow adjusting valve and motor direction swi tch flow adjusting valve |
| JPS5685826A (en) * | 1979-12-14 | 1981-07-13 | Hitachi Ltd | Vacuum treatment device |
| JPS5696841A (en) * | 1979-12-28 | 1981-08-05 | Fujitsu Ltd | Microwave plasma treating apparatus |
| JPS5696840A (en) * | 1979-12-28 | 1981-08-05 | Fujitsu Ltd | Microwave plasma treating method |
| JPS56174846U (en]) * | 1980-05-26 | 1981-12-23 | ||
| JPS5735322A (en) * | 1980-08-13 | 1982-02-25 | Fujitsu Ltd | Removal of photo-resist film |
| JPS602773B2 (ja) * | 1980-08-13 | 1985-01-23 | 富士通株式会社 | ホトレジスト膜の除去方法 |
| DE3049036C2 (de) * | 1980-12-24 | 1984-09-13 | Fa. Carl Freudenberg, 6940 Weinheim | Verfahren zum gleichzeitigen, kontinuierlichen Verfestigen und Beschichten eines Vliesstoffes |
| DE3049037C2 (de) * | 1980-12-24 | 1984-05-03 | Fa. Carl Freudenberg, 6940 Weinheim | Verfahren zum gleichzeitigen, kontinuierlichen Verfestigen und Beschichten eines Vliesstoffes |
| JPS5887825A (ja) * | 1981-11-20 | 1983-05-25 | Fujitsu Ltd | マイクロ波プラズマ処理装置 |
| JPH02224237A (ja) * | 1990-01-16 | 1990-09-06 | Hitachi Ltd | 真空処理方法 |
-
1973
- 1973-05-07 JP JP4972073A patent/JPS565574B2/ja not_active Expired
Also Published As
| Publication number | Publication date |
|---|---|
| JPS501667A (en]) | 1975-01-09 |